Related references
Note: Only part of the references are listed.Angled etching of Si by ClF3-Ar gas cluster injection
Toshio Seki et al.
JAPANESE JOURNAL OF APPLIED PHYSICS (2017)
Fabrication of a Si lever structure made by double-angled etching with reactive gas cluster injection
T. Seki et al.
APPLIED PHYSICS LETTERS (2017)
Reactive etching by ClF3-Ar neutral cluster beam with scanning
Toshio Seki et al.
JAPANESE JOURNAL OF APPLIED PHYSICS (2016)
Faraday cage angled-etching of nanostructures in bulk dielectrics
Pawel Latawiec et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2016)
High-aspect-ratio patterning by ClF3-Ar neutral cluster etching
Hiroki Yamamoto et al.
MICROELECTRONIC ENGINEERING (2015)
Angled etching of (001) rutile Nb-TiO2 substrate using SF6-based capacitively coupled plasma reactive ion etching
Akihiro Matsutani et al.
JAPANESE JOURNAL OF APPLIED PHYSICS (2014)
Angular dependences of SiO2 etch rates in C4F6/O2/Ar and C4F6/CH2F2/O2/Ar plasmas
Sung-Woon Cho et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2012)
Free-Standing Mechanical and Photonic Nanostructures in Single-Crystal Diamond
Michael J. Burek et al.
NANO LETTERS (2012)
Anisotropic Etching Using Reactive Cluster Beams
Kunihiko Koike et al.
APPLIED PHYSICS EXPRESS (2010)
Oblique-Directional Plasma Etching of Si Using a Faraday Cage
Jin-Kwan Lee et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2009)
Direct creation of three-dimensional photonic crystals by a top-down approach
Shigeki Takahashi et al.
NATURE MATERIALS (2009)
Three-dimensional silicon integration
J. U. Knickerbocker et al.
IBM JOURNAL OF RESEARCH AND DEVELOPMENT (2008)
Developments of plasma etching technology for fabricating semiconductor devices
Haruhiko Abe et al.
JAPANESE JOURNAL OF APPLIED PHYSICS (2008)
Study of plasma charging-induced white pixel defect increase in CMOS active pixel sensor
Ken Tokashiki et al.
THIN SOLID FILMS (2007)
High-speed processing with high-energy SF6 cluster ion beam
T. Seki et al.
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS (2007)
Three-dimensional photonic crystals based on double-angled etching and wafer-fusion techniques
Shigeki Takahashi et al.
APPLIED PHYSICS LETTERS (2006)
Generation of the large current cluster ion beam
T Seki et al.
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS (2003)
Angular dependence of SiO2 etch rate at various bias voltages in a high density CHF3 plasma
GR Lee et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS (2002)
Angular dependence of SiO2 etching in a fluorocarbon plasma
BO Cho et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS (2000)
Share Paper
