Journal
IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume 69, Issue 5, Pages 2457-2461Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2022.3161253
Keywords
Silicon; Photoconductivity; Photodetectors; Electrodes; Photonics; Substrates; Surface waves; Distribution of photocurrent rate; monotonic function; Schottky junction; Si wavelength sensor
Funding
- National Natural Science Foundation of China [62074048, 62075053, U20A20216]
- Fundamental Research Funds for the Central Universities [JZ2018HGXC0001, PA2020GDKC0024]
- Open Foundation of Anhui Provincial Key Laboratory of Advanced Functional Materials and Devices [4500411104/011]
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In this study, a wavelength sensor capable of quantitatively measuring the wavelength of UV to NIR light was presented. The sensor has a unique operation mechanism and can easily distinguish a 1 nm wavelength difference.
In this work, a wavelength sensor that is capable of quantitatively distinguishing the wavelength in the range of ultraviolet (UV) to near-infrared (NIR) light (265-1050 nm) is presented. The wavelength sensor is fabricated by depositing two parallel Au electrodes on the two sides of a 200 mu m Si wafer. It is found that the as-formed two photodetectors display completely different optical properties. And then, the relationship between the photocurrent ratio of two photodetectors and incident wavelength can be described as a numerical function, through which the wavelength from 265 to 1050 nm can be precisely calculated. The unique operation mechanism of the Si wavelength sensor is unveiled by technology computer-aided design (TCAD) simulation. Remarkably, the wavelength sensor easily distinguishes the light with a wavelength difference of 1 nm, which is much better than previously reported devices based on the vertically stacked structures and charge collection narrowing mechanism.
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