4.3 Article Proceedings Paper

Localized surface plasmon-enhanced photoluminescence of amorphous silicon quantum dots through plasmonic subwavelength crossed metallic gratings

Journal

JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 55, Issue 4, Pages -

Publisher

IOP PUBLISHING LTD
DOI: 10.7567/JJAP.55.04EH15

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We investigate experimentally the enhancing effect of plasmonic subwavelength crossed Ag gratings on photoluminescence (PL) from the amorphous silicon quantum dots (a-Si QDs) embedded in a central silicon-rich SiOx film of the Ag/SiOx:a-Si QDs/Ag sandwich nanostructures. The use of the crossed Ag grating structure as the top layer in the sandwich nanostructures results in a 2-fold increase in the PL peak intensity and a 1.34-fold increase in the integrated emission intensity compared with the use of a one-dimensional (1D) Ag grating top layer, and a 1.53-fold peak intensity increase compared with that of a SiOx:a-Si QDs/Ag structure without a Ag top layer. These significant PL enhancements can be attributed to the high light-extraction efficiency of the polarization-independent crossed metallic grating structure, the strong out-coupling of localized surface plasmons (LSPs), and the strong a-Si QD-LSP coupling. (C) 2016 The Japan Society of Applied Physics

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