Fracture mechanics of microcrystalline/nanocrystalline composited multilayer chemical vapor deposition self-standing diamond films

Though microwave plasma chemical vapor deposition (MPCVD) diamond films exhibit extraordinary strength, the toughness improvement is still a huge challenge. The catastrophic fracture of the diamond films is undesirable in many applications, especially for the application of fabricating cutting tools. In the present study, adopting the pre-notched and unnotched cantilever bending tests, fracture behaviors of monolayer microcrystalline diamond (m-M), monolayer nanocrystalline diamond (m-N), and microcrystalline/nanocrystalline composited multilayer diamond films were observed and compared. Typical fracture mechanics, including Young's modulus (E), fracture strength (sigma F), and fracture toughness (KIC) of different diamond films were investigated. Effects of diamond crystal structure, intrinsic stress, and tensile-side roughness were systematically analyzed. Grain size and graphite phase content dominated the E of self-standing diamond films. Tensive-side surface roughness and intergranular bonding strength affected the sigma F. When the growth side in tension, E of the multilayer film (modulation period ? = 3 h) was 16.0% lower than m-M and 26.6% higher than m-N, sigma F of multilayer film was 16.8% higher than m-M and 8.3% lower than m-N. At fixed ?, doubling the total deposition period, E, sigma F, and KIC of the multilayer film increased 72.3%, 22.3%, and 2.7%, respectively. MCD/NCD composited multilayer architecture presented significant strengthening and toughening effects on self-standing diamond films.

Automated summary

This study observed and compared the fracture behavior of different diamond films and investigated their fracture mechanics. The study found that factors such as diamond crystal structure, intrinsic stress, and surface roughness have an impact on the performance of diamond films.