4.5 Article

Effects of the stepped sidewall morphology on the ON-state performance for vertical GaN trench-gate MOSFETs

Related references

Note: Only part of the references are listed.
Article Engineering, Electrical & Electronic

Switching Performance Analysis of Vertical GaN FinFETs: Impact of Interfin Designs

Hengyu Wang et al.

Summary: This article investigates the switching performance of vertical GaN power FinFETs and introduces three new interfin designs. The study reveals that the split-gate (SG) structure significantly improves device turn-on/off speed and reduces switching losses in 1.2-kV vertical GaN power FinFETs.

IEEE JOURNAL OF EMERGING AND SELECTED TOPICS IN POWER ELECTRONICS (2021)

Article Physics, Applied

Impact of channel mobility on design optimization of 600-3300 V-class high-speed GaN vertical-trench MOSFETs based on TCAD simulation

Takashi Ishida et al.

Summary: By evaluating various factors, we found that a higher channel mobility (especially 200 cm(2)V-1s(-1)) is crucial for achieving good switching performance and low cost in GaN vertical-trench metal-oxide-semiconductor field-effect transistors.

APPLIED PHYSICS EXPRESS (2021)

Article Engineering, Electrical & Electronic

Effects of p-GaN Body Doping Concentration on the ON-State Performance of Vertical GaN Trench MOSFETs

Renqiang Zhu et al.

Summary: The letter reports the influence of p-GaN body doping concentration on the ON-state performance of vertical GaN trench MOSFETs. Lowering the p-GaN body doping concentration results in enhanced maximum drain current, reduced specific ON-resistance, and decreased threshold voltage. By tuning the Mg concentration in p-GaN, high ON-performance was demonstrated in a quasi-vertical GaN trench MOSFET on sapphire.

IEEE ELECTRON DEVICE LETTERS (2021)

Article Engineering, Electrical & Electronic

On the Conduction Properties of Vertical GaN n-Channel Trench MISFETs

Eldad Bahat Treidel et al.

Summary: The ON-state conductance properties of vertical GaN n-channel trench MISFETs on different GaN substrates were studied, with the best performance seen on ammonothermal GaN substrate. It was found that semiconductor border traps in the p-GaN layer and channel surface roughness scattering significantly impact device performance, with effects dependent on gate trench orientation and GaN substrate defect density.

IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY (2021)

Article Engineering, Electrical & Electronic

Exploration of gate trench module for vertical GaN devices

M. Ruzzarin et al.

MICROELECTRONICS RELIABILITY (2020)

Article Engineering, Electrical & Electronic

Large-Area 1.2-kV GaN Vertical Power FinFETs With a Record Switching Figure of Merit

Yuhao Zhang et al.

IEEE ELECTRON DEVICE LETTERS (2019)

Article Engineering, Electrical & Electronic

Large-Area In-Situ Oxide, GaN Interlayer-Based Vertical Trench MOSFET (OG-FET)

Dong Ji et al.

IEEE ELECTRON DEVICE LETTERS (2018)

Article Engineering, Electrical & Electronic

Improved Dynamic RON of GaN Vertical Trench MOSFETs (OG-FETs) Using TMAH Wet Etch

Dong Ji et al.

IEEE ELECTRON DEVICE LETTERS (2018)

Article Engineering, Electrical & Electronic

Demonstration of GaN Current Aperture Vertical Electron Transistors With Aperture Region Formed by Ion Implantation

Dong Ji et al.

IEEE TRANSACTIONS ON ELECTRON DEVICES (2018)

Article Engineering, Electrical & Electronic

Materials and processing issues in vertical GaN power electronics

Jie Hu et al.

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING (2018)

Article Physics, Applied

Activation of buried p-GaN in MOCVD-regrown vertical structures

Wenshen Li et al.

APPLIED PHYSICS LETTERS (2018)

Article Engineering, Electrical & Electronic

In Situ Oxide, GaN Interlayer-Based Vertical Trench MOSFET (OG-FET) on Bulk GaN substrates

Chirag Gupta et al.

IEEE ELECTRON DEVICE LETTERS (2017)

Article Physics, Applied

Trench formation and corner rounding in vertical GaN power devices

Yuhao Zhang et al.

APPLIED PHYSICS LETTERS (2017)

Article Physics, Applied

Normally-off p-GaN/AlGaN/GaN high electron mobility transistors using hydrogen plasma treatment

Ronghui Hao et al.

APPLIED PHYSICS LETTERS (2016)

Proceedings Paper Engineering, Electrical & Electronic

Vertical heterojunction field-effect transistors utilizing re-grown AlGaN/GaN two-dimensional electron gas channels on GaN substrates

Seiji Yaegassi et al.

PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 8, NO 2 (2011)

Article Physics, Applied

GaN metal-oxide-semiconductor field-effect transistor inversion channel mobility modeling

A. Perez-Tomas et al.

JOURNAL OF APPLIED PHYSICS (2009)

Article Physics, Applied

Field-effect mobility temperature modeling of 4H-SiC metal-oxide-semiconductor transistors

A. Perez-Tomas et al.

JOURNAL OF APPLIED PHYSICS (2006)