Wafer-Scale Photolithography-Pixeled Pb-Free Perovskite X-ray Detectors

Pb-free perovskite material is considered to be a promising material utilized in next-generation X-ray detectors due to its high X-ray absorption coefficient, decent carrier transport properties, and relatively low toxicity. However, the pixelation of the perovskite material with an industry-level photolithography processing method remains challenging due to its poor structural stability. Herein, we use Cs2AgBiBr6 perovskite material as the prototype and investigate its interaction with photolithographic polar solvents. Inspired by that, we propose a wafer-scale photolithography patterning method, where the pixeled perovskite array devices for X-ray detection are successfully prepared. The devices based on pixeled Pb-free perovskite material show a high detection sensitivity up to 19118 +/- 763 mu C Gy(air)(-1) cm(-2), which is comparable to devices with Pb-based perovskite materials and superior to the detection sensitivity (similar to 20 mu C Gy(air)(-1) cm(-2)) of the commercial a-Se detector. After pixelation, the devices achieve an improved spatial resolution capacity with the spatial frequency from 2.7 to 7.8 lp mm(-1) at modulation-transfer-function (MTF) = 0.2. Thus, this work may contribute to the development of high-performance array X-ray detectors based on Cs2AgBiBr6 perovskite material.

Automated summary

This study investigates the interaction between Cs2AgBiBr6 perovskite material and photolithographic polar solvents. It proposes a wafer-scale photolithography patterning method to prepare pixelated perovskite array devices for X-ray detection. The devices show high detection sensitivity and improved spatial resolution capacity.