4.7 Review

Application of Semi-Mechanistic Pharmacokinetic and Pharmacodynamic Model in Antimicrobial Resistance

Journal

PHARMACEUTICS
Volume 14, Issue 2, Pages -

Publisher

MDPI
DOI: 10.3390/pharmaceutics14020246

Keywords

semi-mechanistic PK; PD model; antimicrobial resistance; mathematical equation; dosage regimen

Funding

  1. National key research and development program [2016YFD0501310]

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Antimicrobial resistance is a significant public health issue. The semi-mechanistic PK/PD model is a mathematical tool that captures the relationship between dose, exposure, and response in terms of the mechanism, allowing for the optimization of dosage regimens and the suppression of resistance development.
Antimicrobial resistance is a major public health issue. The pharmacokinetic/pharmacodynamic (PK/PD) model is an essential tool to optimize dosage regimens and alleviate the emergence of resistance. The semi-mechanistic PK/PD model is a mathematical quantitative tool to capture the relationship between dose, exposure, and response, in terms of the mechanism. Understanding the different resistant mechanisms of bacteria to various antibacterials and presenting this as mathematical equations, the semi-mechanistic PK/PD model can capture and simulate the progress of bacterial growth and the variation in susceptibility. In this review, we outline the bacterial growth model and antibacterial effect model, including different resistant mechanisms, such as persisting resistance, adaptive resistance, and pre-existing resistance, of antibacterials against bacteria. The application of the semi-mechanistic PK/PD model, such as the determination of PK/PD breakpoints, combination therapy, and dosage optimization, are also summarized. Additionally, it is important to integrate the PD effect, such as the inoculum effect and host response, in order to develop a comprehensive mechanism model. In conclusion, with the semi-mechanistic PK/PD model, the dosage regimen can be reasonably determined, which can suppress bacterial growth and resistance development.

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