Design and Fabrication of Laser Protective Lenses Based on Multilayered Notch Filter with Low Residual Stress and Low Surface Roughness

We present a new laser protective lens based on a multilayered notch filter design with low residual stress and low surface roughness. An18-layer notch filter was prepared by electron beam evaporation with an ion-assisted deposition technique, which was composed of SiO2 and Nb2O5 with a center wavelength of 532 nm. The optical transmittance, residual stress, surface roughness, and surface morphology were measured by a UV/VIS/NIR spectrophotometer, Twyman-Green interferometer, scanning probe microscope, Linnik microscopic interferometer, and field-emission scanning electron microscopy (FE-SEM). The transmittance of the notch filters at center wavelength is 0.2%, and the average transmittance of the transmission band is about 70%. The residual stress of the notch filter is -0.298 GPa, and the root mean square surface roughness is 1.88 nm. The experimental results show that the optical transmittance meets the design requirements.

Automated summary

A new laser protective lens based on a multilayered notch filter design with low residual stress and low surface roughness has been developed. The experimental results show that the optical transmittance meets the design requirements, with a transmittance of 0.2% at the center wavelength and an average transmittance of 70% in the transmission band.