Journal
ADVANCED SCIENCE
Volume 8, Issue 24, Pages -Publisher
WILEY
DOI: 10.1002/advs.202102756
Keywords
nanogap; nanofabrication; nanoelectronics; nanophotonics; plasmonics
Categories
Funding
- NTNU NanoLab
- NTNU [81771118]
- Research Council of Norway [221860/F60]
- NTNU Nano through its Impact Fund
- DFG Cluster of Excellence econversion [EXC 2089/1-390776260]
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This study evaluates some of the most promising techniques for nanogap fabrication, including traditional methods like photolithography, electron-beam lithography, and focused ion beam milling, as well as newer methods using novel electrochemical and mechanical means for patterning. The physical principles behind each method are reviewed, and their strengths and limitations for nanogap patterning are discussed in terms of resolution, fidelity, speed, ease of implementation, versatility, and scalability to large substrate sizes.
Metallic nanogaps with metal-metal separations of less than 10 nm have many applications in nanoscale photonics and electronics. However, their fabrication remains a considerable challenge, especially for applications that require patterning of nanoscale features over macroscopic length-scales. Here, some of the most promising techniques for nanogap fabrication are evaluated, covering established technologies such as photolithography, electron-beam lithography (EBL), and focused ion beam (FIB) milling, plus a number of newer methods that use novel electrochemical and mechanical means to effect the patterning. The physical principles behind each method are reviewed and their strengths and limitations for nanogap patterning in terms of resolution, fidelity, speed, ease of implementation, versatility, and scalability to large substrate sizes are discussed.
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