Journal
NANOMATERIALS
Volume 12, Issue 3, Pages -Publisher
MDPI
DOI: 10.3390/nano12030565
Keywords
metal oxide nanocrystals; band gap; Burstein-Moss effect; band gap renormalization; nonthermal plasmas; atomic layer deposition; intense pulsed light
Categories
Funding
- NSF through the MRSEC [DMR-2011401]
- National Science Foundation [ECCS-2025124]
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In this study, a tunable band gap range in zinc oxide nanocrystals films is achieved using atomic layer deposition and intense pulsed light. The importance of Al2O3 coating in band gap tuning is demonstrated.
Transparent conductive oxides (TCOs) are widely used in optoelectronic devices such as flat-panel displays and solar cells. A significant optical property of TCOs is their band gap, which determines the spectral range of the transparency of the material. In this study, a tunable band gap range from 3.35 eV to 3.53 eV is achieved for zinc oxide (ZnO) nanocrystals (NCs) films synthesized by nonthermal plasmas through the removal of surface groups using atomic layer deposition (ALD) coating of Al2O3 and intense pulsed light (IPL) photo-doping. The Al2O3 coating is found to be necessary for band gap tuning, as it protects ZnO NCs from interactions with the ambient and prevents the formation of electron traps. With respect to the solar spectrum, the 0.18 eV band gap shift would allow ~4.1% more photons to pass through the transparent layer, for instance, into a CH3NH3PbX3 solar cell beneath. The mechanism of band gap tuning via photo-doping appears to be related to a combination of the Burstein-Moss (BM) and band gap renormalization (BGN) effects due to the significant number of electrons released from trap states after the removal of hydroxyl groups. The BM effect shifts the conduction band edge and enlarges the band gap, while the BGN effect narrows the band gap.
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