Journal
NANOMATERIALS
Volume 11, Issue 10, Pages -Publisher
MDPI
DOI: 10.3390/nano11102554
Keywords
LiNbO3 single-crystal; polyimide material; silicon substrate; chemical mechanical polishing
Categories
Funding
- National Key Ramp
- D Program of China [2019YFB2004802, 2019YFF0301802]
- National Natural Science Foundation of China [62171415, 51975541]
- Key Ramp
- D Projects of Shanxi Province [201903D111005]
- Shanxi Scholarship Council of China [2021-112]
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The study successfully achieved the integration technology of wafer-level LiNbO3 single-crystal thin film on Si, optimizing the spin-coating speed and obtaining high-quality adhesive under different baking conditions to achieve high bonding strength. Through further polishing treatment, the thickness of LiNbO3 single crystal was successfully reduced, and a defect-free bonding interface was obtained.
An integration technology for wafer-level LiNbO3 single-crystal thin film on Si has been achieved. The optimized spin-coating speed of PI (polyimide) adhesive is 3500 rad/min. According to Fourier infrared analysis of the chemical state of the film baked under different conditions, a high-quality PI film that can be used for wafer-level bonding is obtained. A high bonding strength of 11.38 MPa is obtained by a tensile machine. The bonding interface is uniform, completed and non-porous. After the PI adhesive bonding process, the LiNbO3 single-crystal was lapped by chemical mechanical polishing. The thickness of the 100 mm diameter LiNbO3 can be decreased from 500 to 10 mu m without generating serious cracks. A defect-free and tight bonding interface was confirmed by scanning electron microscopy. X-ray diffraction results show that the prepared LiNbO3 single-crystal thin film has a highly crystalline quality. Heterogeneous integration of LiNbO3 single-crystal thin film on Si is of great significance to the fabrication of MEMS devices for in-situ measurement of space-sensing signals.
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