Burger Model as the Best Option for Modeling of Viscoelastic Behavior of Resists for Nanoimprint Lithography

In this study, Atomic Force Microscopy-based nanoindentation (AFM-NI) with diamond-like carbon (DLC) coated tip was used to analyze the mechanical response of poly(methyl methacrylate) (PMMA) thin films (thicknesses: 235 and 513 nm) on a silicon substrate. Then, Oliver and Pharr (OP) model was used to calculate hardness and Young's modulus, while three different Static Linear Solid models were used to fit the creep curve and measure creep compliance, Young's modulus, and viscosity. Values were compared with each other, and the best-suited method was suggested. The impact of four temperatures below the glass transition temperature and varied indentation depth on the mechanical properties has been analyzed. The results show high sensitivity on experiment parameters and there is a clear difference between thin and thick film. According to the requirements in the nanoimprint lithography (NIL), the ratio of hardness at demolding temperature to viscosity at molding temperature was introduced as a simple parameter for prediction of resist suitability for NIL. Finally, thinner PMMA film was tentatively attributed as more suitable for NIL.

Automated summary

This study used AFM-NI and OP model to analyze the mechanical properties of PMMA thin films, finding high sensitivity to experimental parameters with clear differences between thin and thick films. A simple parameter, the ratio of hardness to viscosity, was proposed for evaluating resist suitability for NIL, suggesting that thinner PMMA films are more suitable.