4.8 Article

Formation of Highly Active NiO(OH) Thin Films from Electrochemically Deposited Ni(OH)2 by a Simple Thermal Treatment at a Moderate Temperature: A Combined Electrochemical and Surface Science Investigation

Journal

ACS CATALYSIS
Volume 12, Issue 2, Pages 1508-1519

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acscatal.1c04589

Keywords

nickel hydroxides; electrocatalysis; oxygen evolution reaction; Raman spectroscopy; X-ray photoelectron spectroscopy

Funding

  1. National Natural Science Foundation of China [22002040]
  2. Postdoctoral International Exchange Program [242707]
  3. State Key Laboratory of Powder Metallurgy, Central South University, Changsha, China [621022117]
  4. Key Laboratory of High Performance Ceramic Fibers (Xiamen University), Ministry of Education, Xiamen, China [0044-K4319011]
  5. German Science Foundation [SPP 1613, PAK 981]
  6. Excellency graduate school Energy Science and Engineering [GSC 1070]

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Electrodeposited alpha-Ni(OH)(2) thin films on Ti substrates were studied as cost-effective electrocatalysts for water-splitting devices. Annealing the films at 150 degrees C for 1 h significantly enhances their electrocatalytic activity for the oxygen evolution reaction. The induced structural evolution of alpha-Ni(OH)(2) improves electrical conductivity and accelerates the generation of active sites, resulting in improved activity and stability.
Electrodeposited alpha-Ni(OH)(2) thin films on Ti substrates were investigated as electrocatalysts for cost-effective water-splitting devices. A facile annealing of the alpha-Ni(OH)(2) films at 150 degrees C for 1 h is of extreme importance to enhance their electrocatalytic activity for the oxygen evolution reaction (OER). Voltammetric analysis combined with X-ray photoelectron spectroscopy (XPS), Raman spectroscopy, and scanning electron microscopy (SEM) reveals that the induced structural evolution of the alpha-Ni(OH)(2) results in a strong improvement of electrical conductivity, which is a crucial factor for the highly enhanced activity. Moreover, the annealing accelerates the generation of active sites, which can even be further improved easily via electrochemical galvanostatic conditioning. Thus, the alpha-Ni(OH)(2) thin films exhibit an overpotential of 310 mV (at j = 10 mA cm(-2)) with a Tafel slope of 42.6 mV dec(-1) in 1.0 M KOH, which is much better than that for a commercial RuO2/Ti electrode. The active component at the applied electrode potential of 10 mA cm(-2) is characterized to be gamma-(NiO0.63)-O-2-O-.-O-63(OH)(1.)(37) showing an apparent oxidation state of +2.63 for the Ni. In addition, the annealed electrocatalyst exhibits only a negligible overpotential increase after 26 h of measurement. The overpotential even decreases to 292 mV in the first 3 h, demonstrating outstanding electrocatalytic activity and long-term stability.

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