Journal
VACUUM
Volume 193, Issue -, Pages -Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.vacuum.2021.110547
Keywords
CVD diamond; Erbium oxide antireflective films; Microstructure; Composition; Properties
Funding
- Fundamental Research Funds for the Central Universities, China [FRF-GF-20-49Z, FRF-GF-20-29B]
- Science and Technology Innovation Special Project of Foshan Government, China [BK20BE021]
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In this study, Er2O3 antireflective films were deposited on CVD diamond substrates using RF magnetron sputtering, and the effects of deposition temperature on the structure, chemical composition, and properties of the films were investigated. Results showed that with increasing deposition temperature, the deposition rate, grain size, and surface roughness of the films increased. Furthermore, hardness and modulus of the Er2O3 antireflective films were enhanced at higher deposition temperatures, improving IR transmittance and adhesion strength on the CVD diamond substrates.
To improve the transmittance of chemical vapor deposition (CVD) diamond, erbium(III) oxide (Er2O3) antireflective films were deposited on CVD diamond substrates by radio frequency (RF) magnetron sputtering. Effects of deposition temperature on structure, chemical composition and properties of the samples were investigated. A strong correlation was observed between the deposition temperature and crystalline structure evolution of the Er2O3 antireflective films. With rising deposition temperature, the deposition rate, grain size and surface roughness of the Er2O3 antireflective films increased. Changes of composition and chemical bonding of the films were analyzed. Results showed that the amount of bonding between Er and O atoms surface as the temperature increased. The films were structured by amorphous, monoclinic and cubic phase, with preferential orientations of C-Er2O3 {222} at deposition temperature increased to 400 degrees C. A thickness of 10 nm transition layer was observed between the Er2O3 antireflective films and the CVD diamond substrates by transmission electron microscopy (TEM). Moreover, the transition layer feature primarily consisted of Er, O and C. The hardness and modulus of Er2O3 antireflective films were increased for higher deposition temperature, which positively affects the IR transmittance and adhesion strength of the Er2O3 antireflective films on CVD diamond substrates.
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