Low Optical Writing Energy Multibit Optoelectronic Memory Based on SnS2/h-BN/Graphene Heterostructure

With the rapid development of artificial intelligence and neural network computing, the requirement for information storage in computing is gradually increasing. Floating gate memories based on 2D materials has outstanding characteristics such as non-volatility, optical writing, and optical storage, suitable for application in photonic in-memory computing chips. Notably, the optoelectronic memory requires less optical writing energy, which means lower power consumption and greater storage levels. Here, the authors report an optoelectronic memory based on SnS2/h-BN/graphene heterostructure with an extremely low photo-generated hole tunneling barrier of 0.23 eV. This non-volatile multibit floating gate memory shows a high switching ratio of 10(6) and a large memory window range of 64.8 V in the gate range +/- 40 V. And the memory device can achieve multilevel storage states of 50 under a low power light pulses of 0.32 nW and small light pulse width of 50 ms. Thanks to the Fowler-Nordheim tunneling of the photo-generated holes, the optical writing energy of the optoelectronic memory has been successfully reduced by one to three orders of magnitude compared to existing 2D materials-based systems.

Automated summary

The authors have developed an optoelectronic memory based on SnS2/h-BN/graphene heterostructure with an extremely low photo-generated hole tunneling barrier. This floating gate memory exhibits high switching ratio and large memory window range, capable of achieving multilevel storage states under low power light pulses.