Journal
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
Volume 219, Issue 3, Pages -Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/pssa.202100208
Keywords
electron beam irradiation; graphene-like films; self-aligned gates; silicon oxide
Funding
- [075-00355-21-00]
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Graphene-like films (GLFs) are selectively deposited on preirradiated silicon oxide/silicon structures with high conductivity, serving as gate material for metal-oxide-semiconductor (MOS) devices. By carefully tuning both the energy and dose, high-quality capacitance-voltage characteristics can be achieved in GLF-gated MOS structures. A notable current modulation in selectively grown GLFs is observed when using the GLF-gated MOS as a pseudo-field effect transistor structure.
Graphene-like films (GLFs) are selectively deposited on the silicon oxide/silicon structures preirradiated with electrons at various electron energies and irradiation doses. These films demonstrate high conductivity and are used as a gate material for metal-oxide-semiconductor (MOS)-based devices. It is shown that high-quality capacitance-voltage characteristics of the GLF-gated MOS structures can be obtained if both an energy and a dose are carefully tuned. Using the GLF-gated MOS as a pseudo-field effect transistor structure, a notable current modulation in the selectively grown GLF is observed.
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