4.6 Article

Ultra-low loss visible light waveguides for integrated atomic, molecular, and quantum photonics

Journal

OPTICS EXPRESS
Volume 30, Issue 5, Pages 6960-6969

Publisher

Optica Publishing Group
DOI: 10.1364/OE.448938

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Funding

  1. Defense Advanced Research Projects Agency [FA9453-19-C-0030]
  2. Advanced Research Projects Agency Energy [DE-AR0001042]

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This study reports the lowest waveguide losses and highest resonator Q values in the visible range, which are crucial for integrated applications utilizing atomic, molecular, and optical systems. A wafer-scale compatible Si3N4 platform is introduced for fabricating waveguides of different wavelengths on the same wafer. These results represent a significant advancement in waveguide platforms operating in the visible range.
Atomic, molecular and optical (AMO) visible light systems are the heart of precision applications including quantum, atomic clocks and precision metrology. As these systems scale in terms of number of lasers, wavelengths, and optical components, their reliability, space occupied, and power consumption will push the limits of using traditional laboratory-scale lasers and optics. Visible light photonic integration is critical to advancing AMO based sciences and applications, yet key performance aspects remain to be addressed, most notably waveguide losses and laser phase noise and stability. Additionally, a visible light integrated solution needs to be wafer-scale CMOS compatible and capable of supporting a wide array of photonic components. While the regime of ultra-low loss has been achieved at telecommunication wavelengths, progress at visible wavelengths has been limited. Here, we report the lowest waveguide losses and highest resonator Qs to date in the visible range, to the best of our knowledge. We report waveguide losses at wavelengths associated with strontium transitions in the 461 nm to 802 nm wavelength range, of 0.01 dB/cm to 0.09 dB/cm and associated intrinsic resonator Q of 60 Million to 9.5 Million, a decrease in loss by factors of 6x to 2x and increase in Q by factors of 10x to 1.5x over this visible wavelength range. Additionally, we measure an absorption limited loss and Q of 0.17 dB/m and 340 million at 674 nm. This level of performance is achieved in a wafer-scale foundry compatible Si3N4 platform with a 20nm thick core and TEOS-PECVD deposited upper cladding oxide, and enables waveguides for different wavelengths to be fabricated on the same wafer with mask-only changes per wavelength. These results represent a significant step forward in waveguide platforms that operate in the visible, opening up a wide range of integrated applications that utilize atoms, ions and molecules including sensing, navigation, metrology and clocks. (C) 2022 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement

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