The effects of argon plasma treatment on ITO properties and the performance of OLED devices

In this work, the surface of indium tin oxides (ITO) was treated with argon plasma at different plasma exposure times, namely 4, 6, and 8 min. The effect of treatment on the physical properties of ITOs and the performance of organic light-emitting diodes (OLEDs) using a glass/ITO/PEDOT: PSS/Alq3/Al structure were investigated. The ITOs were characterized by X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), atomic force microscopy (AFM), and visible-ultraviolet (UV-vis) spectroscopy. Based on the results, the treatment does not change the structure and transparency of ITOs; however, it improves the surface morphology and reduces the value of the surface roughness of ITOs. OLEDs fabricated by the current density profile, resistance, and radiation were investigated. The study results showed a decrease in turn-on voltage (from 5.7 to 3 V) and resistance on the one hand, and an increase in irradiance due to surface treatment by plasma on the other hand.

Automated summary

Argon plasma treatment improves the surface morphology and reduces the surface roughness of ITOs. OLEDs fabricated by plasma treatment show improvements in turn-on voltage and resistance, as well as an increase in irradiance.