4.6 Article

Scaling behavior of dynamic hysteresis in multiferroic Bi5FeTi3O15 thin films

Journal

JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
Volume 32, Issue 23, Pages 27333-27338

Publisher

SPRINGER
DOI: 10.1007/s10854-021-07103-x

Keywords

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Funding

  1. National Science Foundation of China [11374169]
  2. Natural Science Foundation of Shandong Province [ZR2019MA004]
  3. Distinguished Middle-Aged and Young Scientist Encourage and Reward Foundation of Shandong Province [BS2014DX014]
  4. Shandong Provincial Key Research and Development Program (Public Welfare Science and Technology Research) [2019GGX103010]
  5. Research and Innovation Team on Materials Modification and Optoelectronic Devices at extreme conditions

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In this study, Bi5FeTi3O15 (BFTO) thin films were successfully obtained using a sol-gel process, exhibiting advanced multiferroic properties. The scaling relationship of the dynamic ferroelectric hysteresis with the applied electrical field magnitude and frequency was investigated, with the findings indicating the potential applications of BFTO thin films in multi-state storage due to the insensitivity of domain reversal to both frequency and electrical field magnitude.
In this study, Bi5FeTi3O15 (BFTO) thin films were obtained on silicon wafers using a sol-gel process. Advanced multiferroic properties, with a remnant polarization P-r of similar to 28 mu C/cm(2) and a saturated magnetization M-s of similar to 1.4 emu/cm(3), were observed in a sample. The scaling of the dynamic ferroelectric hysteresis as a function of the magnitude E-0 and the frequency f of an applied electrical field was investigated. The scaling relationship of the P-E loops was found to take the form < A > proportional to f(-0.19)E(0)(4.47) at low E-0 and < A > proportional to f(-0.05)E(0)(1.26) at high E-0. The exponents of the scaling that domain reversal in the BFTO thin films is insensitive to f at both low and high E-0. This indicates the extensive potential applications of BFTO thin films in multi-state storage.

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