Journal
JOURNAL OF APPLIED PHYSICS
Volume 131, Issue 5, Pages -Publisher
AIP Publishing
DOI: 10.1063/5.0080227
Keywords
-
Categories
Funding
- JSPS KAKENHI [20H02212, 15H03999]
- JST-PRESTO [JPMJPR19I7]
- Ministry of Education, Culture, Sports, and Technology (MEXT) in Japan, National Key Research and Development Program of China [2018YFE0125700]
- Science Challenge Project [TZ2018003]
- National Key Research and Development Program of China [2016YFA0301200]
- National Natural Science Foundation of China (NNSFC) [62074091, U1930402]
- BAQIS Research Program [Y18G27]
- Grants-in-Aid for Scientific Research [20H02212] Funding Source: KAKEN
Ask authors/readers for more resources
This study demonstrates that highly stressed GaN on Si nanomechanical resonators exhibit high quality factor and low temperature coefficient of resonance frequency at elevated temperatures. This is achieved through the high stress and geometrical nonlinearity of dynamical strain in the GaN resonator, which compensates for the dissipation caused by the change of material properties with increasing temperature.
Conventionally, mechanical resonators exhibit evident degradation in quality factor and large frequency fluctuation at elevated temperatures above room temperature. Here, we show that the quality factor of up to 10 5 of a highly stressed GaN on Si nanomechanical resonators experiences little change as temperature increasing to 600 K and the temperature coefficient of the resonance frequency (TCF) is as low as several ppm/K, several times lower than those of the conventional GaN mechanical resonators. The high quality factor and low TCF at high temperatures are attributed to the high stress and the geometrical nonlinearity of dynamical strain in the GaN resonator, where the dissipation caused by the change of the material properties with the increasing temperature is compensated by the increased stiffness. This observation violates the universality of thermal energy dissipation in mechanical resonators. The results provide a universal strategy for engineering nanomechanical resonators with ultrahigh sensitivity and ultralow noise.& nbsp;Published under an exclusive license by AIP Publishing
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available