4.6 Article

Hydrogen impurities in p-type semiconductors, GeS and GeTe

Journal

JOURNAL OF APPLIED PHYSICS
Volume 130, Issue 19, Pages -

Publisher

AIP Publishing
DOI: 10.1063/5.0063080

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Investigating the shallow impurity levels formed by hydrogen defects in semiconductors is an important topic in semiconductor research. The mu SR experiments confirmed the formation of muonium in GeS, but not in GeTe, indicating that it does not affect the electrical properties. The properties of muonium suggested it does not form a typical impurity level that influences the electrical properties.
Hydrogen defects sometimes form shallow impurity levels in semiconductors, and it is an important topic for semiconductor research to investigate their details. One of the experimental methods to determine the state of hydrogen is the muon spin rotation ( mu SR) experiment. By observing formation of a pseudo-hydrogen atom, called muonium, it is possible to investigate the hydrogen defect levels. In a previous theoretical study, the pinning levels were calculated for various materials as a reference for hydrogen defect levels, and these levels were universally distributed near the hydrogen electrode potential. Based on the prediction, mu SR experiments were performed for germanium sulfide (GeS) and germanium telluride (GeTe), where the hydrogen electrode potential is located in the bandgap for GeS, but not for GeTe. As a result, the mu SR spectra showed that the muonium forms in GeS, while it does not in GeTe. In GeS, 58% of the muons formed muoniums. The activation energy was obtained as & UDelta; E = 26.2 & PLUSMN; 6.9 meV. The hyperfine coupling frequency was omega c ( 2 pi ) - 1 = 1.95 & PLUSMN; 0.17 GHz, and the Bohr radius of muonium was 1.3 times larger than that in vacuum. These properties indicated that the identified muonium does not form a typical impurity level that affects the electrical properties.

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