☆
4.7
Article
Phase transformation of sputtered hafnium oxide by post annealing treatment and its effect on the amorphous Si-In-Zn-O thin film transistor
JOURNAL OF ALLOYS AND COMPOUNDS (2022)
Rate this paper
The primary rating indicates the level of overall quality for the paper. Secondary ratings independently reflect strengths or weaknesses of the paper.
Publish scientific posters with Peeref
Peeref publishes scientific posters from all research disciplines. Our Diamond Open Access policy means free access to content and no publication fees for authors.
Learn MoreFind the ideal target journal for your manuscript
Explore over 38,000 international journals covering a vast array of academic fields.
Search