4.7 Article

Resolving one of the holy grails of catalysis: Direct nonoxidative methane conversion to ethylene over plasma-assisted atomically dispersed Pt catalyst

Journal

INTERNATIONAL JOURNAL OF HYDROGEN ENERGY
Volume 47, Issue 98, Pages 41527-41539

Publisher

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.ijhydene.2021.12.200

Keywords

Methane utilization; Methane C-H bond Activation; Ethylene; Pt composite catalyst

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This study successfully addresses the challenge of direct nonoxidative methane conversion to ethylene and synthesizes a novel PtCe/CuX-ZY catalyst with excellent catalytic performance in terms of methane conversion, ethylene yield, hydrogen yield, and the ratio of ethylene to ethane.
One of the holy grails of catalysis -direct nonoxidative methane conversion to ethylene is resolved in this study using dielectric barrier discharge plasma (DBDP) assisted catalysis. Motivated by the formation of ethane and very low amount of ethylene in the DBDP over acid or base treated kaolin supported Ni and oxalate ligand functionalized Ni in CO2 reforming of methane wherein Ni catalysts that were calcined at 800 degrees C showing higher methane conversion (XCH4), ethylene to ethane (C2 = /C2-) ratio, and hydrogen yield (YH2). A novel CeO2 confined atomically dispersed Pt supported on oxalate ligand functionalized Cu modified zeolite Y catalyst (PtCe/CuX-ZY) was synthesized to exhibit strong-metal-support interaction, which rendered the d-band center far away from the Fermi level, densification, and localization of d electrons thus weakening the adsorption of C2H4 upon formation to prevent subsequent hydrogenation to ethane. The novel PtCe/CuX-ZY catalyst showed an impressively high average XCH4, YC2H4, and YH2 of 73.5%, 23.9%, and 33.8%, respectively with a high C2 = /C2- ratio of ca. 12.3 compared to an average of 0.032 observed over Ni-based catalysts. This finding is impressive and opened up a further investigation in both academia and the industry.(c) 2021 Hydrogen Energy Publications LLC. Published by Elsevier Ltd. All rights reserved.

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