4.4 Article

Epitaxial Ferrimagnetic Mn4N Thin Films on GaN by Molecular Beam Epitaxy

Journal

IEEE TRANSACTIONS ON MAGNETICS
Volume 58, Issue 2, Pages -

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TMAG.2021.3085853

Keywords

Ferrimagnet; gallium nitride; Hall effect; manganese nitride; molecular beam epitaxy (MBE); wide bandgap semiconductor

Funding

  1. Semiconductor Research Corporation (SRC) as nCORE [2758.001]
  2. NSF through the Energy-Efficient Computing: from Devices to Architectures (E2CDA) Program [ECCS 1740286, NewLAW EFRI 1741694]
  3. NSF through the Materials Research Science and Engineering Centers (MRSEC) Program [DMR-1719875]
  4. Cornell Center for Materials Research (CCMR)
  5. [MRI DMR-1631282]

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Using plasma-assisted molecular beam epitaxy (MBE), significantly improved ferrimagnetic Mn4N layers are successfully grown on GaN, with unique epitaxial registry and comparable magnetotransport properties.
Direct epitaxial integration of magnetic layers with wide bandgap nitride semiconductors will enable spin-controlled transport and photonic phenomena, seeding ideas for functional spintronic devices. Using plasma-assisted molecular beam epitaxy (MBE) in a previously unexplored window, significantly improved ferrimagnetic Mn4N layers are successfully grown on GaN with similar to 1 nm surface roughness. Distinct from earlier reports, the Mn4N layers grown on GaN are found to be [001] oriented with 12-fold in-plane symmetry in the diffraction pattern. This unique epitaxial registry originates from three equivalent rotational domains. The ferrimagnetic magnetotransport properties of low growth temperature Mn4N layers on GaN are comparable to those reported on cubic substrates such as MgO. However, a sign-flip of the Hall resistance is discovered for Mn4N layers grown above 300 degrees C.

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