Novel RDD Pulse Shaping Method for High-Power High-Voltage Pulse Current Power Supply in DBD Application

High-voltage pulse power supplies are key power input devices for the study and application of discharge plasma. A high-voltage pulse current power supply (HV-PCPS) with an energy storage pulse transformer based on flyback topology can output microsecond pulsewidths with high-power, ultrahigh voltage, and high reliability, which are suitable for most dielectric barrier discharge (DBD) plasma applications. However, during the process of DBD driven by an HV-PCPS based on an energy storage pulse transformer, the output pulse voltage waveform quality is poor, making it not suitable for stable discharge long-term operation. This article aims to solve the aforementioned problem and proposes a novel resistor-diode-diode (RDD) shaping method. Not only can this novel method solve the problem of poor quality of the output pulse power from the HV-PCPS, guaranteeing stable discharge for various DBD electrodes, it can also limit the maximum output voltage amplitude. This prevents overvoltage breakdown when the output terminal is in an open state or a light load state because the HV-PCPS is acting as a current source. This article also analyzes the effectiveness of an RDD branch when solving the problem in theory, and gives a detailed parameter design method. Finally, a 30-kV HV-PCPS prototype is built to verify the effectiveness of the proposed RDD pulse shaping method. The average pulse power output of the whole prototype is greatly improved, and it can achieve an average pulse power output of 1 kW. Furthermore, the electrode loads of different DBD reactors can be driven by this technology.

Automated summary

This article introduces a high-voltage pulse current power supply (HV-PCPS) based on RDD shaping method, which can solve the problem of poor waveform quality, ensure stable discharge, and limit the maximum output voltage amplitude. The effectiveness of the proposed method is verified through a 30kV HV-PCPS prototype.