Journal
ELECTROCHIMICA ACTA
Volume 404, Issue -, Pages -Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.electacta.2021.139756
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Funding
- Vinnova [2016-05156]
- AForsk Foundation [20-310]
- Swedish Research Council
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The corrosion resistances of CoCrFeMnNi magnetron-sputtered thin films with different carbon concentrations were investigated in acidic environments. The results showed that the electrochemical behavior of the films, particularly in the chromium transpassive region, was significantly influenced by the carbon concentration and experimental conditions. At high potentials, the carbon-containing films exhibited better corrosion resistance in hydrochloric acid than in sulfuric acid, attributed to a slower carbon oxidation rate in hydrochloric acid, facilitating the formation of a manganese-rich oxide layer.
The corrosion resistances of near equimolar CoCrFeMnNi magnetron-sputtered thin films with different carbon concentrations were examined in 0.05 M HCl and 0.05 M H2SO4. Polarization curves were recorded with different scan rates with and without reducing the native oxide. The results showed that the carbon concentration and the experimental conditions affected the electrochemical behaviour mainly in the Cr transpassive region. At potentials above 850 mV, the carbon-containing films were more corrosion resistant in 0.05 M HCl than in 0.05 M H2SO4 due to a lower carbon oxidation rate in 0.05 M HCl, facilitating the formation of a Mn-rich oxide layer. (c) 2021 The Author(s). Published by Elsevier Ltd.
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