Journal
CERAMICS INTERNATIONAL
Volume 47, Issue 21, Pages 30729-30740Publisher
ELSEVIER SCI LTD
DOI: 10.1016/j.ceramint.2021.07.252
Keywords
Microstructure; Mechanical properties; Thermal fracture; CrN film
Categories
Funding
- National Natural Science Foundation of China [51922002, 51771025]
- Fundamental Research Funds for the Central Universities [FRF-TP-17-19-003C1Z]
- Government of the Russian Federation [2020-220-08-6662]
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The research demonstrates that the growth structure, properties, and oxidation behavior of CrN films are influenced by the gas flow ratio, with the film having a (200) preferred orientation and zone II structure performing the best, and an increase in surface roughness with time. A dense microstructure is favorable in preventing coating oxidation.
In this research, reactive pulsed dc magnetron sputtering with different Ar/N2 gas flow ratios was used to deposit CrN films with three growth structures on Si substrates. The phase structure, morphology, mechanical properties, thermal fracture properties, and oxidation behavior of films were studied. The surface roughness, residual stress, preferred orientation, and hardness were affected by the gas flow ratio. The film with (200) preferred orientation and zone II structure performed the best. The surface roughness increased to 6 nm with time when the films fractured at 500 degrees C. The Cr interlayer oxidation caused by oxygen diffusion through grain boundaries and fracture accelerated degradation of CrN films at higher temperatures. A dense microstructure is favorable for preventing coating oxidation.
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