Journal
APPLIED SURFACE SCIENCE
Volume 587, Issue -, Pages -Publisher
ELSEVIER
DOI: 10.1016/j.apsusc.2022.152791
Keywords
Phosphorus; Surface reaction; X-ray photoelectron spectroscopy; Infrared spectroscopy; Infrared head-space analysis; Phosphine
Categories
Funding
- National Science Foundation [CHE-2001611, DMR-1720415]
- U.S. Army [W911SR19C0015]
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A method using plasma-deposited carbon to suppress phosphine and acidic phosphorus production on red phosphorus particles has been developed. The study found that increasing deposition time can result in thicker and more uniform carbon coatings, leading to a significant decrease in phosphine generation and surface phosphorus oxide formation.
Red phosphorus, when exposed to humid environments in air, breaks down into toxic phosphine gas and acidic phosphorus species, presenting a challenge for many applications, such as flame retardants or pyrotechnic obscurants. We have developed and characterized a method of plasma-deposited carbon to form a nanometer-thick, chemically stable carbon layer on red phosphorus particles to suppress phosphine and acidic phosphorus production. Using a combination of XPS surface analysis and a novel IR headspace analysis method, we developed and quantified an understanding of the reaction of red phosphorus with water vapor and the suppression of decomposition products using plasma-deposited carbon coatings. Phosphine production, quantified by IR, was accompanied by the formation of surface POx species produced as the particles react with water vapor. Increasing plasma deposition time increased thickness and uniformity of graphitic carbon coating, corresponding to a marked decrease in phosphine generation and formation of surface POx species.
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