4.7 Article

Characteristics of a mixed-gas cluster ion beam for time-of-flight secondary ion mass spectrometry

Journal

APPLIED SURFACE SCIENCE
Volume 572, Issue -, Pages -

Publisher

ELSEVIER
DOI: 10.1016/j.apsusc.2021.151467

Keywords

Mixed-gas duster ion beam; Time-of-flight secondary ion mass spectrometry; CO2 clusters; Mass spectra

Funding

  1. Korea Basic Science Institute [D110100]
  2. Ministry of SMEs and Startups (MSS, Korea) [S2965542]
  3. Korea Technology & Information Promotion Agency for SMEs (TIPA) [S2965542] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
  4. National Research Council of Science & Technology (NST), Republic of Korea [D110100] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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Studied the characteristics of gas cluster ion beam (GCIB) and found that the secondary ion efficiency is highest with a CO2/Ar mole fraction ratio of 96%, doubling the efficiency compared to pure Ar clusters.
The gas cluster ion beam (GCIB) is a valuable tool for surface analysis, providing new 3D mass analysis equipment possibilities. The main feature of the GCIB is that many particles are involved during the collision of the cluster ion beam with a sample surface. Studying the characteristics of the GCIB is essential for improving the performance of the analysis equipment. We evaluated the efficiency of the GCIB using a mixed-gas of Ar and CO2 as a primary ion beam for time-of-flight secondary ion mass spectrometry. We measured the characteristic factors and composition of the cluster ion beam depending on the mole fraction ratio of CO2/Ar. We measured that the CO2 composition of the output cluster ion beam rapidly increases to over 95% when the mole fraction ratio of CO2 increases by more than 10% in the injected mixed gas. Nevertheless, the optimal ratio of the CO2/Ar mole fraction (%) to increase the secondary ion efficiency was 96% CO2, which more than doubled the secondary ion efficiency over that of pure Ar clusters. The beam spot size began rapidly decreasing from 95% CO2, and it was reduced by up to 0.67 times at 100% CO2. According to the mixed-gas ratio, the sputtering yield of the Si wafer was 8 times lower than that of pure Ar clusters.

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