Optimization of coating uniformity in a simple rotation system by using a rotating shadow mask

A theoretically designed rotating shadow mask is proposed to optimize the uniformity of a simple rotation system, which makes full use of the width of the coating chamber. This method can fabricate a large-aperture optical component, the diameter of which is more than half the width of the coating machine. The rotating shadow mask is applied to correct the film thickness uniformity near the center point of simple plane substrate. The factors influencing the effect of the rotating shadow mask are simulated and discussed. Then the shape of the rotating shadow mask is theoretically designed, and the uniformity within a corresponding radius is well corrected. After determining the shape of the rotating shadow mask, an additional fixed shadow mask is calculated and used to improve the uniformity of the entire substrate. Through the application of the two shadow masks together, uniformity about 99.5% is obtained in the diameter of 640 mm on a 1100 mm coating machine. (C) 2021 Optical Society of America

Automated summary

A theoretically designed rotating shadow mask is proposed to optimize the uniformity of a simple rotation system, allowing the fabrication of large-aperture optical components using the width of the coating chamber. The shape of the rotating shadow mask is determined through simulation and discussion, and an additional fixed shadow mask is used to improve the uniformity of the entire substrate.