4.8 Article

High-Performance Harsh-Environment-Resistant GaOX Solar-Blind Photodetectors via Defect and Doping Engineering

Journal

ADVANCED MATERIALS
Volume 34, Issue 1, Pages -

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.202106923

Keywords

defect engineering; doping engineering; gallium oxide; recrystallization; solar-blind photodetectors

Funding

  1. National Natural Science Foundation of China (NSFC) [61925110, U20A20207, 61821091, 62004184, 62004186, 51961145110]
  2. Strategic Priority Research Program of the Chinese Academy of Sciences (CAS) [XDB44000000]
  3. Key Research Program of Frontier Sciences of Chinese Academy of Sciences [QYZDB-SSW-JSC048]
  4. Key-Area Research and Development Program of Guangdong Province [2020B010174002]
  5. Fundamental Research Funds for the Central Universities [WK2100000014, WK2100000010]
  6. University of Science and Technology of China (USTC) [KY2100000109]
  7. China Postdoctoral Science Foundation [2020M671895, BX20200320]
  8. Opening Project of the Key Laboratory of Microelectronics Devices and Integration Technology in Institute of Microelectronics of CAS
  9. Key Laboratory of Nanodevices and Applications in Suzhou Institute of Nano-Tech
  10. Nano-Bionics of CAS

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The study proposes a defect and doping engineering strategy towards amorphous GaOX (a-GaOX) to achieve highly tolerant and ultra-sensitive solar-blind photodetectors for harsh environments, maintaining high performance even under high temperature or high voltage conditions.
Gallium oxide (Ga2O3), with an ultrawide bandgap, is currently regarded as one of the most promising materials for solar-blind photodetectors (SBPDs), which are greatly demanded in harsh environment, such as space exploration and flame prewarning. However, realization of high-performance SBPDs with high tolerance toward harsh environments based on low-cost Ga2O3 material faces great challenges. Here, defect and doping (DD) engineering towards amorphous GaOX (a-GaOX) has been proposed to obtain ultrasensitive SBPDs for harsh condition application. Serious oxygen deficiency and doping compensation of the engineered a-GaOX film ensure the high response currents and low dark currents, respectively. Annealing item in nitrogen of DD engineering also incurs the recrystallization of material, formation of nanopores by oxygen escape, and suppression of sub-bandgap defect states. As a result, the tailored GaOX SBPD based on DD engineering not only harvests a record-high responsivity rejection ratio (R-254 nm/R-365 nm) of 1.8 x 10(7), 10(2) times higher detectivity, and 2 x 10(2) times faster decay speed than the control device, but also keeps a high responsivity, high photo-to-dark current ratio, and sharp imaging capability even at high temperature (280 degrees C) or high bias (100 V). The proposed DD engineering provides an effective strategy towards highly harsh-environment-resistant GaOX SBPDs.

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