4.8 Article

Synthesis and Characterization of Metallic Janus MoSH Monolayer

Journal

ACS NANO
Volume 15, Issue 12, Pages 20319-20331

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acsnano.1c08531

Keywords

Janus; MoSH; MoSSe; MoS2; plasma; KPFM

Funding

  1. National Natural Science Foundation of China [61804067, 62104165]
  2. Natural Science Foundation of Jiangsu Province, China [BK20170193, BK20210713]
  3. EAMP
  4. I (Entrepreneurship and Innovation) Plan of Jiangsu Province [1256010241180240]
  5. Fundamental Research Funds for the Central Universities of China [JUSRP11746, JUSRP51726B]
  6. Six Talent Peaks Project in Jiangsu Province [DZXX-021]
  7. Taihu Talent Plan in Wuxi City [1256010241200320]
  8. 111 Project [B12018]
  9. NSFC [51802360]
  10. National Natural Science Foundation of Guangdong for Distinguished Young Scholars [2018B030306043]
  11. Pearl River Talent Plan [2019QN01C109]
  12. Science and Technology Program of Guangzhou [201904010449]
  13. Key cultivation program for young teachers of Sun Yat-sen University [20lgzd13]
  14. Research Grants Council of Hong Kong [AoE/P-02/12, 14203018, N_CUHK438/18]
  15. Innovation and Technology Fund [ITS/390/18]

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Janus transition-metal dichalcogenides (TMDCs) are special 2D materials with unique properties, and a controlled synthesis method has been developed with thorough investigation of their formation and properties. The electronic properties of this material, including the high intrinsic carrier concentration and Fermi level, are crucial for potential device applications.
Janus transition-metal dichalcogenides (TMDCs) are emerging as special 2D materials with different chalcogen atoms covalently bonded on each side of the unit cell, resulting in interesting properties. To date, several synthetic strategies have been developed to realize Janus TMDCs, which first involves stripping the top-layer S of MoS2 with H atoms. However, there has been little discussion on the intermediate Janus MoSH. It is critical to find the appropriate plasma treatment time to avoid sample damage. A thorough understanding of the formation and properties of MoSH is highly desirable. In this work, a controlled H-2-plasma treatment has been developed to gradually synthesize a Janus MoSH monolayer, which was confirmed by the TOF-SIMS analysis as well as the subsequent fabrication of MoSSe. The electronic properties of MoSH, including the high intrinsic carrier concentration (similar to 2 x 10(13) cm(-2)) and the Fermi level similar to -4.11 eV), have been systematically investigated by the combination of FET device study, KPFM, and DFT calculations. The results demonstrate a method for the creation of Janus MoSH and present the essential electronic parameters which have great significance for device applications. Furthermore, owing to the metallicity, 2D Janus MoSH might be a potential platform to observe the SPR behavior in the mid-infrared region.

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