Liquid-Metal-Assisted Deposition and Patterning of Molybdenum Dioxide at Low Temperature

Molybdenum dioxide (MoO2), considering its nearmetallic conductivity and surface plasmonic properties, is a great material for electronics, energy storage devices and biosensing. Yet to this day, room-temperature synthesis of large area MoO2, which allows deposition on arbitrary substrates, has remained a challenge. Due to their reactive interfaces and specific solubility conditions, gallium-based liquid metal alloys offer unique opportunities for synthesizing materials that can meet these challenges. Herein, a substrate-independent liquid metal-based method for the room temperature deposition and patterning of MoO2 is presented. By introducing a molybdate precursor to the surrounding of a eutectic gallium-indium alloy droplet, a uniform layer of hydrated molybdenum oxide (H2MoO3) is formed at the interface. This layer is then exfoliated and transferred onto a desired substrate. Utilizing the transferred H2MoO3 layer, a laser-writing technique is developed which selectively transforms this H2MoO3 into crystalline MoO2 and produces electrically conductive MoO2 patterns at room temperature. The electrical conductivity and plasmonic properties of the MoO2 are analyzed and demonstrated. The presented metal oxide room-temperature deposition and patterning method can find many applications in optoelectronics, sensing, and energy industries.

Automated summary

The method presented in the study utilizes liquid metal-based technology to achieve room temperature deposition and patterning of MoO2, providing a new way of fabrication. Through laser writing technique, electrically conductive MoO2 patterns can be obtained on desired substrates. The electrical conductivity and plasmonic properties of MoO2 are analyzed and demonstrated.