4.8 Article

Advances in RF Glow Discharge Optical Emission Spectrometry Characterization of Intrinsic and Boron-Doped Diamond Coatings

Journal

ACS APPLIED MATERIALS & INTERFACES
Volume 14, Issue 5, Pages 7405-7416

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acsami.1c20785

Keywords

GD-OES; diamond; boron doping; XPS; Rietveld refinement; Raman spectroscopy; HFCVD

Funding

  1. Portuguese Foundation for Science and Technology/MCTES [UIDB/50011/2020, UIDP/50011/2020, POCI-01-0247-FEDER-024521]
  2. FEDER, under the PT2020 Partnership Agreement
  3. FCT-Fundacao para a Ciencia e a Tecnologia, I.P. [BPD/UI50/7841/2019, CZ.02.1.01/0.0/0.0/16_019/0000760, CZ.02.1.01/0.0/0.0/15 003/0000464, CSIR-21-4]

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In this study, pulsed RF glow discharge optical emission spectrometry (GD-OES) combined with ultrafast sputtering (UFS) was used to accurately measure the elemental depth profiles and bulk distribution of boron in diamond thin films. The results showed a nonhomogeneous distribution of boron within the diamond crystalline structure, and the effective doping was not linearly correlated to the increasing boron content.
Accurate determination of the effective doping range within diamond thin films is important for fine-tuning of electrical conductivity. Nevertheless, it is not easily attainable by the commonly adopted techniques. In this work, pulsed RF glow discharge optical emission spectrometry (GD-OES) combined with ultrafast sputtering (UFS) is applied for the first time to acquire elemental depth profiles of intrinsic diamond coatings and boron content bulk distribution in films. The GD-OES practical advances presented here enabled quick elemental profiling with noteworthy depth resolution and determination of the film interfaces. The erosion rates and layer thicknesses were measured using differential interferometric profiling (DIP), demonstrating a close correlation between the coating thickness and the carbon/hydrogen gas ratio. Moreover, DIP and the adopted semiquantification methodology revealed a nonhomogeneous bulk distribution of boron within the diamond crystalline structure, i.e., boron doping is both substitutional and interstitial within the diamond framework. DIP measurements also showed that effective boron doping is not linearly correlated to the increasing content introduced into the diamond coating. This is a finding well supported by X-ray diffraction (XRD) Rietveld refinement and X-ray photoelectron spectroscopy (XPS). This work demonstrates the advantage of applying advanced GD-OES operation modes due to its ease of use, affordability, accuracy, and high-speed depth profile analysis capability.

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