4.8 Article

Self-Organized Liquid Crystal Droplets as Phototunable Softmasks

Journal

ACS APPLIED MATERIALS & INTERFACES
Volume 13, Issue 50, Pages 60697-60712

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acsami.1c21811

Keywords

dewetting; self-organization; liquid crystal; mask; soft lithography

Funding

  1. Centre for Nanotechnology and Central Instrumental Facility, IIT Guwahati
  2. MeitY [5(9)/2012-NANO]
  3. MHRD IMPRINT Program [8058]
  4. DST-FIST, Government of India [SR/FST/ETII-028/2010]

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A one-step self-organized pathway is utilized to generate large-area and high-density liquid crystal micro-droplets by spreading an LC-laden volatile liquid film rapidly on an aqueous surfactant bath. Modification of surfactant and LC loadings in the fluid can tune the size, periodicity, and ordering of the microdroplets. The LC microdroplets serve as photomasks for soft-photolithography applications, allowing for the creation of mesoscale three-dimensional features on photoresist films by controlling the movement of photons through the drops.
A single-step self-organized pathway is harnessed to generate large-area and high-density liquid-crystal (LC) micro- droplets via rapid spreading of an LC-laden volatile liquid film on an aqueous surfactant bath. The surfactant loading on the water bath and LC loading in the solvent fluid help in tuning the size, periodicity, and ordering of LC microdroplets. Remarkably, the experiments reveal a transition from a spinodal to heterogeneous nucleation pathway of dewetting when the surfactant loading is modulated from below to beyond the critical micellar concentration in the aqueous phase. In the process, a host of unprecedented drop formation modes, such as dewetting and contact-line instability, random ejection, and fire cracker toroid splitting, have been uncovered. Subsequently, the LC microdroplets on the air-water interface are employed as photomasks suitable for soft-photolithography applications. Such masks help in the decoration of a host of mesoscale three-dimensional features on the films of photoresists when photons are guided through the LC droplets. In such a scenario, phase transition of LC droplets under solvent vapor annealing is employed to control the movement of photons through drops and subsequently modulate the light exposure on the photoresist surface. Such a simple soft-photolithography setup leads to an array of flattened droplets on a positive resist, while donut features are observed on the negative tone. Remarkably, the orientation of nematogens within 4-cyano-4'-pentylbiphenyl droplets and at the three-phase contact-line provides additional handles in controlling the transmission of photons, which facilitates such a unique pattern formation. A number of low-cost and simple strategies are also discussed to order such soft-photolithography patterns. Importantly, with a minor modification to the same experimental setup, we could also measure the variation in the order parameter of the LC droplet during its phase transitions from the nematic to isotropic state.

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