Cost-Effective Fabrication of Fractal Silicon Nanowire Arrays

Silicon nanowires (Si NWs) emerged in several application fields as a strategic element to surpass the bulk limits with a flat compatible architecture. The approaches used for the Si NW realization have a crucial impact on their final performances and their final cost. This makes the research on a novel and flexible approach for Si NW fabrication a crucial point for Si NW-based devices. In this work, the novelty is the study of the flexibility of thin film metal-assisted chemical etching (MACE) for the fabrication of Si NWs with the possibility of realizing different doped Si NWs, and even a longitudinal heterojunction p-n inside the same single wire. This point has never been reported by using thin metal film MACE. In particular, we will show how this approach permits one to obtain a high density of vertically aligned Si NWs with the same doping of the substrate and without any particular constraint on doping type and level. Fractal arrays of Si NWs can be fabricated without any type of mask thanks to the self-assembly of gold at percolative conditions. This Si NW fractal array can be used as a substrate to realize controllable artificial fractals, integrating other interesting elements with a cost-effective microelectronics compatible approach.

Automated summary

The research on the flexibility of thin film metal-assisted chemical etching (MACE) for the fabrication of Si NWs is crucial for Si NW-based devices. It allows the production of differently doped Si NWs and even a longitudinal heterojunction p-n inside the same single wire, which has never been reported using thin metal film MACE. Additionally, fractal arrays of Si NWs can be fabricated without any type of mask, enabling the creation of controllable artificial fractals with other interesting elements in a cost-effective and microelectronics compatible approach.