Femtosecond Laser Engraving of Deep Patterns in Steel and Sapphire

Femtosecond laser engraving offers appealing advantages compared to regular laser engraving such as higher precision and versatility. In particular, the inscription of deep patterns exhibits an increasing interest in industry. In this work, an optimization protocol based on constraining overlap ratio and scan number is demonstrated. The proposed method allows changing overlap ratio while maintaining depth in the same range, which reduces the sampling number. This study WAS applied to stainless steel 316 L and sapphire for engravings deeper than 100 mu m. Results exhibit overall depths higher than threshold values and allowed to determine optimized engraving quality, for instance, roughness in steel can be reduced while maintaining depth and taper angle by reducing overlap ratio. The optimized laser parameters such as roughness and taper angle factors for sapphire were also found to be as follows: 200 kHz, 86% overlap and 12 J/cm(2). As a demonstration, a logo engraving is illustrated at the end.

Automated summary

The study demonstrates an optimization protocol based on constraining overlap ratio and scan number for femtosecond laser engraving of deep patterns. Results show that changing overlap ratio while maintaining depth can reduce sampling number and improve engraving quality.