4.7 Article

Localization to delocalization probed by magnetotransport of hBN/graphene/hBN stacks in the ultra-clean regime

Journal

SCIENTIFIC REPORTS
Volume 11, Issue 1, Pages -

Publisher

NATURE PORTFOLIO
DOI: 10.1038/s41598-021-98266-4

Keywords

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Funding

  1. Japan Society for Promotion of Science (JSPS) KAKENHI [19K15385, 26630139]
  2. NIMS Nanofabrication Platform Project
  3. Ministry of Education, Culture, Sports, Science and Technology (MEXT), Japan
  4. Elemental Strategy Initiative by the MEXT, Japan [JPMXP0112101001]
  5. JSPS KAKENHI [JP20H00354]
  6. CREST, JST [JPMJCR15F3]
  7. NIMS
  8. Malaysia's Ministry of Higher Education (MOHE)
  9. UTM
  10. Grants-in-Aid for Scientific Research [19K15385, 26630139] Funding Source: KAKEN

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We report on the magnetotransport characteristics of a high-quality graphene device encapsulated in hexagonal boron nitride layers, showing an interplay of quantum interferences in Dirac materials at different temperatures. The elastic scattering mechanism in the hBN/Gr/hBN stacks contrasts with conventional graphene on SiO2, and our ultra-clean graphene device exhibits nonzero magnetoconductance at high temperatures up to 300 K.
We report on magnetotransport in a high-quality graphene device, which is based on monolayer graphene (Gr) encapsulated by hexagonal boron nitride (hBN) layers, i.e., hBN/Gr/hBN stacks. In the vicinity of the Dirac point, a negative magnetoconductance is observed for high temperatures > similar to 40 K, whereas it becomes positive for low temperatures <= similar to 40 K, which implies an interplay of quantum interferences in Dirac materials. The elastic scattering mechanism in hBN/Gr/hBN stacks contrasts with that of conventional graphene on SiO2, and our ultra-clean graphene device shows nonzero magnetoconductance for high temperatures of up to 300 K.

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