Related references
Note: Only part of the references are listed.Multilayer Si shadow mask processing of wafer-scale MoS2 devices
Haima Zhang et al.
2D MATERIALS (2020)
In-situformation and evolution of atomic defects in monolayer WSe2under electron irradiation
Robert Leiter et al.
NANOTECHNOLOGY (2020)
Large-scale flexible and transparent electronics based on monolayer molybdenum disulfide field-effect transistors
Na Li et al.
NATURE ELECTRONICS (2020)
Analogue two-dimensional semiconductor electronics
Dmitry K. Polyushkin et al.
NATURE ELECTRONICS (2020)
Reversible writing of high-mobility and high-carrier-density doping patterns in two-dimensional van der Waals heterostructures
Wu Shi et al.
NATURE ELECTRONICS (2020)
Patterning metal contacts on monolayer MoS2 with vanishing Schottky barriers using thermal nanolithography
Xiaorui Zheng et al.
NATURE ELECTRONICS (2019)
Transferred via contacts as a platform for ideal two-dimensional transistors
Younghun Jung et al.
NATURE ELECTRONICS (2019)
Approaching the Schottky-Mott limit in van der Waals metal-semiconductor junctions
Yuan Liu et al.
NATURE (2018)
Gate-tunable room-temperature ferromagnetism in two-dimensional Fe3GeTe2
Yujun Deng et al.
NATURE (2018)
Designing artificial 2D crystals with site and size controlled quantum dots
Xuejun Xie et al.
SCIENTIFIC REPORTS (2017)
X-ray Lithography on Perovskite Nanocrystals Films: From Patterning with Anion-Exchange Reactions to Enhanced Stability in Air and Water
Francisco Palazon et al.
ACS NANO (2016)
Contacts between Two- and Three-Dimensional Materials: Ohmic, Schottky, and p-n Heterojunctions
Yang Xu et al.
ACS NANO (2016)
Influence of electron-beam lithography exposure current level on the transport characteristics of graphene field effect transistors
Sangwoo Kang et al.
JOURNAL OF APPLIED PHYSICS (2016)
Gate-Tunable Atomically Thin Lateral MoS2 Schottky Junction Patterned by Electron Beam
Y. Katagiri et al.
NANO LETTERS (2016)
Defects as a factor limiting carrier mobility in WSe2: A spectroscopic investigation
Zhangting Wu et al.
NANO RESEARCH (2016)
Modification of Graphene/SiO2 Interface by UV-Irradiation: Effect on Electrical Characteristics
Gaku Imamura et al.
ACS APPLIED MATERIALS & INTERFACES (2015)
Electrical contacts to two-dimensional semiconductors
Adrien Allain et al.
NATURE MATERIALS (2015)
Silicene field-effect transistors operating at room temperature
Li Tao et al.
NATURE NANOTECHNOLOGY (2015)
Stencil Nano Lithography Based on a Nanoscale Polymer Shadow Mask: Towards Organic Nanoelectronics
Hoyeol Yun et al.
SCIENTIFIC REPORTS (2015)
Effective Passivation of Exfoliated Black Phosphorus Transistors against Ambient Degradation
Joshua D. Wood et al.
NANO LETTERS (2014)
Residue-free fabrication of high-performance graphene devices by patterned PMMA stencil mask
Fu-Yu Shih et al.
AIP ADVANCES (2014)
Graphene transport properties upon exposure to PMMA processing and heat treatments
Lene Gammelgaard et al.
2D MATERIALS (2014)
Clean transfer of graphene and its effect on contact resistance
Jooho Lee et al.
APPLIED PHYSICS LETTERS (2013)
High mobility ambipolar MoS2 field-effect transistors: Substrate and dielectric effects
Wenzhong Bao et al.
APPLIED PHYSICS LETTERS (2013)
How do the electron beam writing and metal deposition affect the properties of graphene during device fabrication?
Xiaonan Shen et al.
NANOSCALE (2013)
Two-Dimensional Transition Metal Dichalcogenides under Electron Irradiation: Defect Production and Doping
Hannu-Pekka Komsa et al.
PHYSICAL REVIEW LETTERS (2012)
Localized Ion Implantation Through Micro/Nanostencil Masks
Luis Guillermo Villanueva et al.
IEEE TRANSACTIONS ON NANOTECHNOLOGY (2011)
Lithography-free fabrication of high quality substrate-supported and freestanding graphene devices
Wenzhong Bao et al.
NANO RESEARCH (2010)
Organic thin film transistors on flexible polyimide substrates fabricated by full-wafer stencil lithography
Katrin Sidler et al.
SENSORS AND ACTUATORS A-PHYSICAL (2010)
Analysis of the blurring in stencil lithography
O. Vazquez-Mena et al.
NANOTECHNOLOGY (2009)
Predicting mask distortion, clogging and pattern transfer for stencil lithography
Maryna Lishchynska et al.
MICROELECTRONIC ENGINEERING (2007)
Formation of metal nano- and micropatterns on self-assembled monolayers by pulsed laser deposition through nanostencils and electroless deposition
Emiel A. Speets et al.
ADVANCED FUNCTIONAL MATERIALS (2006)