4.8 Article

Inhibited nonradiative decay at all exciton densities in monolayer semiconductors

Journal

SCIENCE
Volume 373, Issue 6553, Pages 448-+

Publisher

AMER ASSOC ADVANCEMENT SCIENCE
DOI: 10.1126/science.abi9193

Keywords

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Funding

  1. U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences, Materials Sciences and Engineering Division [DE-AC02-05-CH11231, KC1201, KC3103]
  2. Samsung Scholarship
  3. Postdoctoral Fellowships for Research Abroad of the Japan Society for the Promotion of Science

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The study found that by applying small mechanical strain, nonradiative exciton-exciton annihilation in transition metal dichalcogenide monolayers can be suppressed, allowing them to maintain a high photoluminescence quantum yield at high brightness levels.
Most optoelectronic devices operate at high photocarrier densities, where all semiconductors suffer from enhanced nonradiative recombination. Nonradiative processes proportionately reduce photoluminescence (PL) quantum yield (QY), a performance metric that directly dictates the maximum device efficiency. Although transition metal dichalcogenide (TMDC) monolayers exhibit near-unity PL QY at low exciton densities, nonradiative exciton-exciton annihilation (EEA) enhanced by van-Hove singularity (VHS) rapidly degrades their PL QY at high exciton densities and limits their utility in practical applications. Here, by applying small mechanical strain (less than 1%), we circumvented VHS resonance and markedly suppressed EEA in monolayer TMDCs, resulting in near-unity PL QY at all exciton densities despite the presence of a high native defect density. Our findings can enable light-emitting devices that retain high efficiency at all brightness levels.

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