Related references
Note: Only part of the references are listed.Study of C, Al, Si and Ge sputtering yield amplification by ion beam analysis and co-sputtering simulation software
J. Cruz et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2019)
Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)
Andre Anders
JOURNAL OF APPLIED PHYSICS (2017)
Ion beam analysis and co-sputtering simulation (CO-SS) of bi-metal films produced by magnetron co-sputtering
J. Cruz et al.
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS (2016)
Increasing the carbon deposition rate using sputter yield amplification upon serial magnetron co-sputtering
Ruediger M. Schmidt et al.
SURFACE & COATINGS TECHNOLOGY (2014)
Modelling of sputtering yield amplification in serial reactive magnetron co-sputtering
T. Kubart et al.
SURFACE & COATINGS TECHNOLOGY (2012)
Modelling of sputtering yield amplification effect in reactive deposition of oxides
T. Kubart et al.
SURFACE & COATINGS TECHNOLOGY (2010)
The metal flux from a rotating cylindrical magnetron: a Monte Carlo simulation
K. Van Aeken et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2008)
Magnetron sputtering: a review of recent developments and applications
PJ Kelly et al.
VACUUM (2000)
Share Paper
