Journal
INTERNATIONAL JOURNAL OF MOLECULAR SCIENCES
Volume 22, Issue 16, Pages -Publisher
MDPI
DOI: 10.3390/ijms22168696
Keywords
molecular mechanism; photocatalysis; sulfonamides; free radicals; TiO2
Funding
- Medical University of Silesia [PCN-1-092/K/0/F]
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This study elucidated the mechanism of sulfisoxazole (SFF) selective removal by photocatalysis in the presence of TiO2 and FeCl3, and compared the degradation pathways of SFF and other antibiotics. FeCl3 facilitates the generation of organic radicals, accelerating the degradation of SFF.
The mechanism of sulfisoxazole (SFF) selective removal by photocatalysis in the presence of titanium (IV) oxide (TiO2) and iron (III) chloride (FeCl3) was explained and the kinetics and degradation pathways of SFF and other antibiotics were compared. The effects of selected inorganic ions, oxygen conditions, pH, sorption processes and formation of coordination compounds on the photocatalytic process in the presence of TiO2 were also determined. The Fe3+ compounds added to the irradiated sulfonamide (SN) solution underwent surface sorption on TiO2 particles and act as acceptors of excited electrons. Most likely, the SFF degradation is also intensified by organic radicals or cation organic radicals. These radicals can be initially generated by reaction with electron holes, hydroxyl radicals and as a result of electron transfer mediated by iron ions and then participate in propagation processes. The high sensitivity of SFF to decomposition caused by organic radicals is associated with the steric effect and the high bond polarity of the amide substituent.
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