Journal
CHEMICAL PHYSICS LETTERS
Volume 776, Issue -, Pages -Publisher
ELSEVIER
DOI: 10.1016/j.cplett.2021.138725
Keywords
Titanium dioxide; Nanomaterials; Adsorbent; Tetracycline; Pollutants
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The research explores the effects of annealing TiO2 nanoparticles at different temperatures, showing that TiO2@600 degrees C exhibits higher crystal dislocation and microstrains, resulting in better dye adsorption performance. Experimental results suggest that more TC molecules are adsorbed on TiO2@600 degrees C due to its higher defects.
New approaches are being developed to improve water purification using semiconductor nanomaterials to meet the 6th Sustainable Development Goal (SDG #6) of the United Nations (UN) on water sanitation. The pollutant removal performance of TiO2 nanoparticles is widely known to depend on its surface area/functionalisation. To unravel other intrinsic properties limiting its performance, a commercial Degussa P25 TiO2 was annealed at different temperatures, 450 degrees C and 600 degrees C, designated TiO2@450 degrees C and TiO2@600 degrees C, respectively. The scanning electron microscopy (SEM), X-ray diffraction spectroscopy (XRD), Brunauer-Emmett-Teller (BET), and electron diffraction spectroscopy (EDS) were employed to investigate the morphology, crystallinity, surface area, and bulk chemical composition, respectively of the as-annealed TiO2samples. While TiO2@450 degrees C samples displayed higher BET surface area and more oxygen content, TiO2@600 degrees C showed higher crystal dislocation and microstrains. Experimental results show better TC adsorption performance using TiO2@600 degrees C, attributed to its higher dislocation density and microstrains compared to TiO2@450 degrees C. Thus, more TC molecules are proposed to be adsorbed on the TiO2@600 degrees C due to their relatively higher defects. To examine the controlling mechanism of the TC adsorption process, the intra-particle diffusion model reveals TiO2@450 degrees C to possess 85 times the boundary layer of TiO2@600 degrees C, which limit diffusion in the former.
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