Journal
CERAMICS INTERNATIONAL
Volume 47, Issue 18, Pages 25689-25695Publisher
ELSEVIER SCI LTD
DOI: 10.1016/j.ceramint.2021.05.295
Keywords
Amorphous Si3N4; Si2N2O; Hot pressing; High-temperature properties
Categories
Funding
- National Natural Science Foundation of China [51272206, 51472198]
- Fundamental Research Funds for the Central Universities [xkjc2014009]
Ask authors/readers for more resources
Dense Si2N2O ceramics were successfully prepared without sintering additives, exhibiting good flexural strength, oxidation resistance, and low dielectric loss tangent at high temperatures.
The high-temperature mechanical and dielectric properties of Si2N2O ceramics are often limited by the introduction of a sintering aid. Herein, dense Si2N2O was prepared at 1700 degrees C by hot-pressing oxidized amorphous Si3N4 powder without sintering additives. A homogeneous network with short-range order and a SiN3O structure was formed in the oxidized amorphous Si3N4 powder during the hot-pressing process. Si2N2O crystals preferentially nucleated at positions within the SiN3O structure and grew into rod-like and plate-like grains. Fully dense ceramics with mainly crystalline Si2N2O and some residual amorphous phases were obtained. The as-prepared Si2N2O possessed a good flexural strength of 311 +/- 14.9 MPa at 1400 degrees C, oxidation resistance at 1500 degrees C, and a low dielectric loss tangent of less than 5 x 10(-3) at 1000 degrees C.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available