Journal
APPLIED SURFACE SCIENCE
Volume 555, Issue -, Pages -Publisher
ELSEVIER
DOI: 10.1016/j.apsusc.2021.149702
Keywords
Transparent conductive oxides; Surface morphology; Hydrogen impurity; Work function; Indium tin oxides; Organic photovoltaic
Categories
Funding
- Basic Science Research Program through the National Research Foundation of Korea (NRF) - Ministry of Education [2019R1A6A3A01091664]
- National Research Foundation of Korea (NRF) - Korea government (MSIP) through GCRC-SOP [2011-0030013]
- Ministry of the Environment [G232019012551]
- National Research Foundation of Korea [2019R1A6A3A01091664] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
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The hydrogen-driven surface amorphization of crystalline In-Sn-O thin films allows for smooth surface morphology and tunability of the work function, leading to improved power conversion efficiency of thin-film solar cells. This method provides a facile way to realize smooth surface morphology of crystalline thin films for optoelectronic applications.
Crystalline transparent conductive oxides are promising candidates as front electrodes in electronic devices due to the high electron mobility and good optical transparency in the visible region. However, the rough surface morphology resulting from the grain growth during the deposition and post-annealing process triggers severe drawbacks in their thin-film applications. Here, we demonstrate the hydrogen-driven surface amorphization of the crystalline In?Sn?O (c-ITO) thin film. By introducing hydrogen gas during the deposition process, the surface of the c-ITO thin film is selectively amorphized, allowing for the smooth surface morphology while preserving the advantages of the crystalline thin film. The progressive surface amorphization of c-ITO thin film offers the tunability of the work function, leading to the improved power conversion efficiency of the thin-film solar cell. Our work provides a facile method to realize the smooth surface morphology of the c-ITO thin films, which can be further utilized for a wide range of crystalline thin films for optoelectronic applications.
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