4.8 Article

Highly Tunable Nanostructures in a Doubly pH-Responsive Pentablock Terpolymer in Solution and in Thin Films

Journal

ADVANCED FUNCTIONAL MATERIALS
Volume 31, Issue 32, Pages -

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adfm.202102905

Keywords

block polymers; dynamic light scattering; grazing-incidence small-angle X-ray scattering; pH-responsive polymers; self-assembly; small-angle X-ray scattering; thin films

Funding

  1. CERIC-ERIC Consortium
  2. Deutsche Forschungsgemeinschaft (DFG) [PA 771/19-1]
  3. Danish Council for Independent Research [DFF 7014-00288]
  4. BMBF [16QK10A]
  5. Projekt DEAL

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Multiblock copolymers with charged blocks exhibit different self-assembly behavior in solutions and thin films, depending on the degree of ionization of the blocks. In solutions, the solubility of the P2VP block and the flexibility of the PDMAEMA block influence structure formation; while in thin films, the segregation strength is crucial for structure formation.
Multiblock copolymers with charged blocks are complex systems that show great potential for enhancing the structural control of block copolymers. A pentablock terpolymer PMMA-b-PDMAEMA-b-P2VP-b-PDMAEMA-b-PMMA is investigated. It contains two types of midblocks, which are weak cationic polyelectrolytes, namely poly(2-(dimethylamino)ethyl methacrylate) (PDMAEMA) and poly(2-vinylpyridine) (P2VP). Furthermore, these are end-capped with short hydrophobic poly(methyl methacrylate) (PMMA) blocks in dilute aqueous solution and thin films. The self-assembly behavior depends on the degrees of ionization alpha of the P2VP and PDMAEMA blocks, which are altered in a wide range by varying the pH value. High degrees of ionization of both blocks prevent structure formation, whereas microphase-separated nanostructures form for a partially charged and uncharged state. While in solutions, the nanostructure formation is governed by the dependence of the P2VP block solubility of the and the flexibility of the PDMAEMA blocks on alpha, in thin films, the dependence of the segregation strength on alpha is key. Furthermore, the solution state plays a crucial role in the film formation during spin-coating. Overall, both the mixing behavior of the 3 types of blocks and the block sequence, governing the bridging behavior, result in strong variations of the nanostructures and their repeat distances.

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