4.8 Article

Substrate-Independent and Re-Writable Surface Patterning by Combining Polydopamine Coatings, Silanization, and Thiol-Ene Reaction

Journal

ADVANCED FUNCTIONAL MATERIALS
Volume 31, Issue 50, Pages -

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adfm.202107716

Keywords

patterning; polydopamine; reversibility; silanization; surface modification

Funding

  1. China Scholarship Council (CSC)
  2. DFG [406232485, LE 2936/9-1]
  3. Helmholtz Program Materials Systems Engineering
  4. Projekt DEAL

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The article introduces a simple and substrate-independent strategy for surface functionalization and patterning, combining the advantages of polydopamine coating, gas phase silanization, and thiol-ene photoclick reaction. It has demonstrated efficient functionalization and patterning of diverse materials, showing the potential for controlled chemical removal of patterns for re-modification or re-patterning of substrates. This universal and powerful approach can significantly assist in the development of novel functional materials and devices for various applications.
Polydopamine coating is a unique, simple, and substrate-independent surface functionalization strategy. Techniques for secondary functionalization, patterning, and re-functionalization of polydopamine modified materials are important to broaden the scope of applications of such materials in a variety of fields. Here, a facile and substrate-independent strategy for surface functionalization and patterning is presented. This approach combines the advantages of three important methods: facile and substrate-independent polydopamine coating, versatile gas phase silanization, and rapid thiol-ene photoclick reaction for patterning. They demonstrate equally efficient functionalization and patterning of diverse materials, such as glass, polytetrafluoroethylene, aluminum, polypropylene, or polyethylene. They also show the possibility of controlled chemical removal of the patterns or surface functionalization by treatment with tetrabutylammonium fluoride, which allows re-modification or re-patterning of the substrate. Thus, this universal and powerful approach for substrate independent surface modification and patterning can significantly facilitate the development of novel functional materials and devices useful for various applications.

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