Controlling the Surface Roughness of Surface-Electrode Ion Trap Based on Micro-Nano Fabrication

The surface-electrode ion trap is one of the most promising devices to realize large-scale and integrated quantum information processing. However, a series of problems are faced in the micro-nano fabrication of surface-electrode ion traps. A prominent one is the difficulty to control the thick film surface roughness. A rough electrode surface could produce excessive radio frequency (RF) loss and deteriorate trapping ability of the surface-electrode ion trap. In this paper, a thick film micro-nano fabrication technology to control the surface roughness is presented, which can reduce the roughness of thick film surface-electrode down to 6.2 nm, while being controllable between 6.2 nm and 45 nm. Therefore, it can also provide a basis for studying the influence of electrode surface roughness on trap performance. The micro-nano fabrication technology is not only suitable for surface-electrode ion traps with various configurations, but also be further applied to researches of MEMS, solar cells and surface science.

Automated summary

The surface-electrode ion trap is a promising device for quantum information processing, but faces challenges in micro-nano fabrication, especially in controlling electrode surface roughness. This paper presents a thick film micro-nano fabrication technology to control surface roughness, reducing it to 6.2 nm and providing a basis for further research on the influence of roughness on trap performance. The technology is not only suitable for various configurations of ion traps, but also applicable to other fields like MEMS, solar cells, and surface science.