CoCrFeNi High-Entropy Alloy Thin Films Synthesised by Magnetron Sputter Deposition from Spark Plasma Sintered Targets

Two magnetron sputter targets of CoCrFeNi High-Entropy Alloy (HEA), both in equal atomic ratio, were prepared by spark plasma sintering. One of the targets was fabricated from a homogeneous HEA powder produced via gas atomisation; for the second target, a mixture of pure element powders was used. Economic benefits can be achieved by mixing pure powders in the intended ratio in comparison to the gas atomisation of the specific alloy composition. In this work, thin films deposited via magnetron sputtering from both targets are analysed. The surface elemental composition is investigated by X-ray photoelectron spectroscopy, whereas the bulk stoichiometry is measured by X-ray fluorescence spectroscopy. Phase information and surface microstructure are investigated using X-ray diffraction and scanning electron microscopy, respectively. It is demonstrated that the stoichiometry, phase composition and microscopic structure of the as-deposited HEA thin films are almost identical if the same deposition parameters are used.

Automated summary

This study analyzed thin films deposited via magnetron sputtering from two different preparation methods of CoCrFeNi High-Entropy Alloy targets and found that their stoichiometry, phase composition, and microscopic structure were almost identical after film deposition with the same parameters.