Negative-tone molecular glass photoresist for high-resolution electron beam lithography

A low molecular weight organic compound containing bis-phenol A backbone (BPA-6OH) is reported as a negative-tone photoresist. This material has a high glass transition temperature and excellent thermal stability. A good contrast, well-resolved line pattern around 73.4 nm and sensitivity of 52 mu C cm(-2) can be received for negative-tone molecular glass photoresist upon exposure in electron beam lithography system. It indicates that the negative-tone molecular glass photoresist is one of the promising candidates for use in electron beam lithography.

Automated summary

The negative-tone molecular glass photoresist shows good contrast, resolution, and sensitivity in electron beam lithography, making it a promising candidate for use in this field.